Microelectronics Industry Use Carbon Tetrafluoride CAS 75-73-0

Basic Information
Place of Origin: CHINA
Brand Name: MOSINTER
Certification: COA
Model Number: Non Toxic Refrigerant - 9
Minimum Order Quantity: 15KG
Price: Negotiation
Packaging Details: Disposable cylinder 25 lb / 11.3 kg;Recycling cylinder 400 l, 926 l;ISO - tanks.
Delivery Time: Within 7 days
Payment Terms: T/T, Western Union
Supply Ability: Negotiation
Detail Information
Name: Carbon Tetrafluoride CAS: 75-73-0
Appearance: Colourless From: Liquid
Purity: 99% Package: As Your Requirement
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commonly used refrigerants


air conditioner refrigerant

Product Description

Carbon tetrafluoride CAS 75-73-0 R14 CF4 Non Toxic Refrigerant




Carbon tetrafluoride, also known as tetrafluoromethane, freon-14 and R 14, is a halogenated hydrocarbon (chemical formula: CF4).It can be regarded as either a halogenated hydrocarbon, halogenated methane, perfluorocarbon, or an inorganic compound.At minus 198 °C, the tetrafluoride has a monocline structure with lattice constants a = 8.597, b= 4.433, C = 8.381 (.10-1 nm), and beta = 118.73°.

Stable under normal temperature and pressure, avoid strong oxidant, inflammable or combustible.Do not fuel gas, high heat after the container pressure increases, there is a risk of cracking, explosion.Chemically stable, non-flammable.At room temperature, only liquid ammonia - sodium metal reagent can act.




Melting point −184 °C(lit.)
Boiling point −130 °C(lit.)
Density (solid, -195°) 1.98; d (liq, -183°) 1.89
Vapor density 3.04 (vs air)
Refractive index 1.1510
Water Solubility mL/100mL in H2O: 0.595 (10°C), 0.490 (20°C), 0.366 (40°C) [LAN05]
Merck 13,1827

Stable. Incompatible with zinc, alkaline earth metals, Group I metals,

aluminium and its alloys. Non-flammable.

CAS DataBase Reference 75-73-0(CAS DataBase Reference)
NIST Chemistry Reference Carbon tetrafluoride(75-73-0)
EPA Substance Registry System Methane, tetrafluoro-(75-73-0)




1. Used in plasma etching process of various integrated circuits, also used as laser gas, used as cryogenic refrigerant, solvent, lubricant, insulating material, and coolant of infrared detector tube.

2. The dosage in the microelectronics industry is the largest plasma etching gas, methane four fluorine high purity gas and four fluorine high purity, high purity oxygen mixture gas, methane can be widely used in silicon, silica, silicon, phosphorus silicon nitride thin film material such as glass and tungsten etching, in electronic components surface cleaning, the solar cell production, laser technology, cryogenic refrigeration, leak test, printed circuit also heavily used in the production of detergent, etc.

3. Plasma dry etching technology used as cryogenic refrigerant and integrated circuit.


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